Congratulations Dr. Thuy Huong for the work "A First-Principles Study of Impurity-Enhanced Adhesion and Lubricity of Graphene on Iron Oxide Surface" published in Journal of Physical Chemistry C!

Graphene is well-known as one of the best solid lubricants for its superlubricity and high mechanical strength. Weak adhesion leading to low interfacial compatibility is a significant challenge of the use of graphene in harsh conditions. In this work, guided by density functional theory (DFT) calculations, Thuy Huong and co-workers propose a method to improve graphene compatibility on Fe2O3 by substituting B, P, S, and Si to some carbon sites. The results shed light on further improved graphene performance without affecting its superlubricity.

Welcome My Hang, who has joined the ALD Research Group as research assistant!

Hang finished her BSc and Master degrees in Environmental Engineering at University of Science, Vietnam National University in 2018 and 2020, respectively. Her previous research activities were on enhancing photocatalytic activity of different metal oxides including CuWO4, TiO2 for degradation of antibiotics pollutants in aqueous environment or textle wastewater treatment. Since March 2021, she works as a research assistant in the ALD research group at Phenikaa University. Her current research focuses on studying Sn- and Cu-based sulfides and oxides by Successive Ionic Layer Adsorption and Reaction (SILAR) and Spatial Atomic Layer Deposition (SALD) for renewable energy-related applications.

Our new paper entitled "Titanium Nitride Nanodonuts Synthesized from Natural Ilmenite Ore as a Novel and Efficient Thermoplasmonic Material" has been accepted for publication in Nanomaterials!

Nanostructures of titanium nitride (TiN) have recently been considered as a new class of plasmonic materials that have been utilized in many solar energy applications. This work presents the synthesis of a novel nanostructure of TiN that has a nanodonut shape from natural ilmenite ore using a low-cost and bulk method. The TiN nanodonuts exhibit strong and spectrally broad localized surface plasmon resonance absorption in the visible region centered at 560 nm, which is well suited for thermoplasmonic applications as a nanoscale heat source. The heat generation is investigated by water evaporation experiments under simulated solar light, demonstrating excellent solar light harvesting performance of the nanodonut structure.

Dr. Thuy Huong Ta joins ALD Research Group as a postdoctoral researcher!

ALD Research Group warmly welcome a new member: Dr. Thuy Huong Ta!

Thuy Huong finished her BSc degree in Engineering Physics at Ho Chi Minh City University of Technology in 2013. From 2014 – 2015, she joined Kasai Research Group as an exchange student at Osaka University, Japan. Huong obtained her MSc degree in Engineering Physics at Ho Chi Minh City University of Technology in 2016. From 2016 to 2020, she was a PhD student under the supervision of Prof. Anh Kiet Tieu at School of Mechanical, Materials, Mechatronic, and Biomedical Engineering, University of Wollongong, Australia, and obtained her PhD degree in Materials in 2020. Since September 2020, she works as a postdoctoral researcher in the ALD research group at Phenikaa University.

We are glad to share our new paper entitled "Gas-phase 3D printing of functional materials", which has just been accepted in Advanced Materials Technologies. (09/2020)

This work shows that Spatial Atomic Layer Deposition (SALD) indeed represents an ideal platform for area-selective deposition of functional materials by proper design and miniaturization of close-proximity SALD heads. Our approach represents a new versatile way of printing functional materials and devices with spatial and topological control, thus extending the potential of SALD and ALD in general, and opening a new avenue in the field of area-selective deposition of functional materials.

Check News for more details.

Our study on the optimization of precursor exposure for the case of Spatial Atomic Layer Deposition (SALD) in order to obtain high-quality films as well as to improve the process efficiency has been accepted in Chemical Engineering Journal, IF: 10.652 (07/2020)

Our paper entitled "Tuning the Photocatalytic Activity of TiO2 Nanoparticles by Ultrathin SiO2 Films Grown by Low-Temperature Atmospheric Pressure Atomic Layer Deposition" has been recently accepted in Applied Surface Science, IF: 6.182 (07/2020)

Welcome to the ALD Research Group at Phenikaa University

The ALD Research Group at Phenikaa University was officially established on the 19th November 2019 and belongs to the Faculty of Electrical and Electronic Engineering. Our main goal is to develop Atomic Layer Deposition processes with the focus on atmospheric pressure ALD techniques, which include Spatial Atomic Layer Deposition - SALD and Fluidized Bed Atomic Layer Deposition - FBALD, for the synthesis, surface engineering and processing of novel nanostructured materials for a wide range of applications, including energy conversion and storage, catalysis, optoelectronics, and biomedical devices.

ALD has been showing a great interest in a wide range of applications such as Integrated Circuits and MEMS, film encapsulation for flexible displays, ALD conformal coating, biocompatible materials or solar cells

Transmission/Scanning Electron Microscope (TEM/SEM) micrographs of (from left to right): Al2O3-coated TiO2 nanoparticles, Pt nanoclusters on graphene, Pt nanoclusters on TiO2 nanoparticles, and Al-doped ZnO/AgNWs nanocomposites deposited on textured silicon substrate, Al2O3-coated silver nanowires (AgNWs), and Al-doped ZnO thin film (images with AgNWs and ZnO were performed in collaboration with Prof. Bellet and Dr. Muñoz-Rojas in Grenoble, France). All the nanomaterials mentioned here were deposited with atmospheric pressure ALD.

About Phenikaa University

Located in Hanoi – the Capital City of Vietnam, established on the 10th October 2007 with its former name Thanh Tay University, and become a member of Phenikaa Group since 2017, the name Phenikaa University has been officially registered in the world education and research map since the 21st November 2018. This is an important milestone that represents the inauguration of a new era of Phenikaa University: We aim to provide high-quality education, research, and social contribution proudly from now on.

Following our brand new name, Phenikaa University has received enormous support from Phenikaa Group for the development of infrastructure, equipment of educational and research facilities, and especially the recruitment of high-quality human resource to realize our ambition of heading Phenikaa University toward an internationally recognized research and education institution following the international standards. Within a year, Phenikaa University has attracted more than 100 young and motivated scientists around the world, including foreign scientists with diverse nationalities, Vietnamese scientists living abroad and Vietnamese scientists from other institutions in Vietnam. The university currently hosts over 400 staff members and 3000 students, and offers more than 20 programs at bachelor and master levels. To create a professional environment and trigger scientific research activities at the university, Phenikaa Group has launched 4 research institutes and centers, including Phenikaa Research and Technology Institute (PRATI), Phenikaa Institute for Advanced Study (PIAS), Phenikaa University Nano Institute (PHENA) and International Center for Social Science Research (ISR), each having an International Advisory Board consisting of well-known scientists from highly ranked universities. In 2019, 9 key research groups and 4 early-stage research groups, led by the most talented scientists of the university, have been established. Ever since, the research activities at the university have been rapidly promoted.