Graphene is well-known as one of the best solid lubricants for its superlubricity and high mechanical strength. Weak adhesion leading to low interfacial compatibility is a significant challenge of the use of graphene in harsh conditions. In this work, guided by density functional theory (DFT) calculations, Thuy Huong and co-workers propose a method to improve graphene compatibility on Fe2O3 by substituting B, P, S, and Si to some carbon sites. The results shed light on further improved graphene performance without affecting its superlubricity.
Nanostructures of titanium nitride (TiN) have recently been considered as a new class of plasmonic materials that have been utilized in many solar energy applications. This work presents the synthesis of a novel nanostructure of TiN that has a nanodonut shape from natural ilmenite ore using a low-cost and bulk method. The TiN nanodonuts exhibit strong and spectrally broad localized surface plasmon resonance absorption in the visible region centered at 560 nm, which is well suited for thermoplasmonic applications as a nanoscale heat source. The heat generation is investigated by water evaporation experiments under simulated solar light, demonstrating excellent solar light harvesting performance of the nanodonut structure.
This work shows that Spatial Atomic Layer Deposition (SALD) indeed represents an ideal platform for area-selective deposition of functional materials by proper design and miniaturization of close-proximity SALD heads. Our approach represents a new versatile way of printing functional materials and devices with spatial and topological control, thus extending the potential of SALD and ALD in general, and opening a new avenue in the field of area-selective deposition of functional materials.
Check News for more details.
Our study on the optimization of precursor exposure for the case of Spatial Atomic Layer Deposition (SALD) in order to obtain high-quality films as well as to improve the process efficiency has been accepted in Chemical Engineering Journal, IF: 10.652 (07/2020)
Our paper entitled "Tuning the Photocatalytic Activity of TiO2 Nanoparticles by Ultrathin SiO2 Films Grown by Low-Temperature Atmospheric Pressure Atomic Layer Deposition" has been recently accepted in Applied Surface Science, IF: 6.182 (07/2020)
Welcome to the ALD Research Group at Phenikaa University
The ALD Research Group at Phenikaa University was officially established on the 19th November 2019 and belongs to the Faculty of Electrical and Electronic Engineering. Our main goal is to develop Atomic Layer Deposition processes with the focus on atmospheric pressure ALD techniques, which include Spatial Atomic Layer Deposition - SALD and Fluidized Bed Atomic Layer Deposition - FBALD, for the synthesis, surface engineering and processing of novel nanostructured materials for a wide range of applications, including energy conversion and storage, catalysis, optoelectronics, and biomedical devices.
Transmission/Scanning Electron Microscope (TEM/SEM) micrographs of (from left to right): Al2O3-coated TiO2 nanoparticles, Pt nanoclusters on graphene, Pt nanoclusters on TiO2 nanoparticles, and Al-doped ZnO/AgNWs nanocomposites deposited on textured silicon substrate, Al2O3-coated silver nanowires (AgNWs), and Al-doped ZnO thin film (images with AgNWs and ZnO were performed in collaboration with Prof. Bellet and Dr. Muñoz-Rojas in Grenoble, France). All the nanomaterials mentioned here were deposited with atmospheric pressure ALD.
About Phenikaa University
Located in Hanoi – the Capital City of Vietnam, established on the 10th October 2007 with its former name Thanh Tay University, and become a member of Phenikaa Group since 2017, the name Phenikaa University has been officially registered in the world education and research map since the 21st November 2018. This is an important milestone that represents the inauguration of a new era of Phenikaa University: We aim to provide high-quality education, research, and social contribution proudly from now on.
Following our brand new name, Phenikaa University has received enormous support from Phenikaa Group for the development of infrastructure, equipment of educational and research facilities, and especially the recruitment of high-quality human resource to realize our ambition of heading Phenikaa University toward an internationally recognized research and education institution following the international standards. Within a year, Phenikaa University has attracted more than 100 young and motivated scientists around the world, including foreign scientists with diverse nationalities, Vietnamese scientists living abroad and Vietnamese scientists from other institutions in Vietnam. The university currently hosts over 400 staff members and 3000 students, and offers more than 20 programs at bachelor and master levels. To create a professional environment and trigger scientific research activities at the university, Phenikaa Group has launched 4 research institutes and centers, including Phenikaa Research and Technology Institute (PRATI), Phenikaa Institute for Advanced Study (PIAS), Phenikaa University Nano Institute (PHENA) and International Center for Social Science Research (ISR), each having an International Advisory Board consisting of well-known scientists from highly ranked universities. In 2019, 9 key research groups and 4 early-stage research groups, led by the most talented scientists of the university, have been established. Ever since, the research activities at the university have been rapidly promoted.