Schematic representation of our custom head integrating both the precursor injector and the atmospheric plasma generator

Breaking news: our paper has been accepted for publication in Chemistry of Materials (IF > 10).

In this work, we present a low-temperature, open-air process based on spatial atomic layer deposition (SALD) that yields high purity SiO2 films at temperatures down to room temperature. The films were obtained by operating our SALD system in CVD mode (i.e. allowing precursor crosstalk), using an oxygen plasma in combination with Trivinylmethoxysilane. 3D printing was employed to fabricate custom heads integrating both the precursor injector and the atmospheric plasma generator. Our results show that conformal, pinhole-free SiO2 thin films can be deposited by our atmospheric plasma-enhanced spatial chemical vapor deposition (APE-SCVD) approach at low temperatures (RT – 180 °C) on different substrates, including silicon wafers, micro-glass slides, or even on polymeric substrates with a high growth rate up to 2 – 5 nm/min. Even though the deposition of SiO2 was carried out at low temperatures in the open air using a metalorganic precursor, no contamination from SiNx or SiCx, was observed by FTIR and XPS measurements. Our results open the door to the low-temperature, fast printing of Si-based devices. This work was done in collaboration with Dr. David Muñoz-Rojas in LMGP, University Grenoble Alpes, France.

Scanning Electron Microscope images of ZnO/CdS NRs (a) and ZnO/Au/CdS NRs (b); and Transmission Electron Microscope images of ZnO/Au/CdS (c & d).

Our new paper has been accepted for publication in Chemical Communications (IF > 6).

In this work, omnidirectional Au nanoparticle-embedded ZnO/CdS core/shell heterostructures were fabricated on ITO substrates for photoelectrochemical water-splitting photoelectrodes by combining electrospinning, hydrothermal treatment, photoreduction and chemical bath deposition. The obtained omnidirectional heterostructures harvested solar light efficiently, provided good electrical conductivity, and enhanced the charge transfer between CdS and ZnO that eventually enhanced photoconversion efficiency.

On the 19th September 2019, ALD Research Group was officially founded!

On the photo from the left to the right, Dr. Vu Van Truong, Dr. Dang The Hung, Dr. Bui Van Hao, Dr. Vu Ngoc Hai and Dr. Dao Van Duong, the leaders of potential research groups receive Establishment Decision from President of Phenikaa University, Prof. Dr. Pham Thanh Huy.

The 2019 Best Thesis Prize of French Chemical Society (the solid state chemistry division ) has been awarded to Viet Huong Nguyen.

His PhD was performed in the laboratory LMGP, and CEA-INES, France on the development of transparent electrodes by vacuum-free and low-cost deposition methods for photovoltaic applications. The thesis manuscript is available online from here.

Congratulations, Dr. Viet Huong Nguyen!